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O. V. Naumova
B. I. Fomin



Author(s) and WSEAS

O. V. Naumova
B. I. Fomin


WSEAS Transactions on Systems and Control


Print ISSN: 1991-8763
E-ISSN: 2224-2856

Volume 13, 2018

Notice: As of 2014 and for the forthcoming years, the publication frequency/periodicity of WSEAS Journals is adapted to the 'continuously updated' model. What this means is that instead of being separated into issues, new papers will be added on a continuous basis, allowing a more regular flow and shorter publication times. The papers will appear in reverse order, therefore the most recent one will be on top.


Volume 13, 2018



Interface-State Density in SOI-FET Sensors

AUTHORS: O. V. Naumova, B. I. Fomin

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ABSTRACT: SOI-FET sensors are high-sensitivity analytical devices used for qualitative and quantitative analyses of biological and chemical substances. Decreasing and monitoring of the state density at surface of sensors are the key tasks to increase their sensitivity and reproducibility of parameters of devices. This study aims to apply the threshold voltage method to the SOI-FET sensor/electrolyte systems to determine the density of states in the sensors. For this aim: 1) a dependency between the sensor threshold voltage and the voltage on the electrode immersed in the electrolyte solution was derived, 2) the analytical and experimental dependencies were used to determine the density of states at the sensor surface Dit, 3) errors in Dit related to the uncertainty of values of components of the electrolyte capacitance were determined. It was shown that the uncertainty in the Dit values can be estimated in the process of measuring in solutions with various salt concentrations (1-100 mM). The maximal error in Dit related to the uncertainty of capacitance associated with the charge adsorbed on the sensor surface Qad can be estimated using the well-known design parameters of sensor, the salt concentration in solution and Qad=0. In particular, it was shown that for sensors with typical parameters (the buried oxide thickness of 200 nm, sensor thickness of 30 nm and top-oxide thickness of 2 nm) this error in Dit2 does not exceed 40% in the 100 mM buffer solutions. The threshold voltage method can be successfully applied for monitoring Dit at the stage of cleaning and activation of the sensor surface.

KEYWORDS: interface-state density, biosensor, silicon-on-insulator, field-effect transistor

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WSEAS Transactions on Systems and Control, ISSN / E-ISSN: 1991-8763 / 2224-2856, Volume 13, 2018, Art. #58, pp. 514-519


Copyright Β© 2018 Author(s) retain the copyright of this article. This article is published under the terms of the Creative Commons Attribution License 4.0

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